Tantalum particles are widely used in the evaporation coating industry, mainly including the following aspects:

1. Film preparation

Tantalum metal particles, as the basic material, can be used to prepare various thin films. During evaporation, tantalum particles are heated to high temperatures,

 vaporize and deposit on the substrate to form a thin film. This film has good adhesion and uniformity, and is widely used in display, solar cell and other fields.

2. Resistance material

Evaporating tantalum particles can be used to prepare resistance films. Tantalum particles are combined with other materials to form a composite that can adjust resistance. 

This resistance film can be used in electronic components, sensors and other fields.

3. Conductive materials

Tantalum particles can also be used to prepare conductive films. Under specific process conditions, tantalum particles can react with other materials to form conductive layers. 

Conductive film is widely used in electronic components, circuit boards and other fields.

Characteristics of tantalum particles

Tantalum particles have the following characteristics:

1. High melting point

Tantalum particles have a very high melting point and can be used under high temperature conditions. This makes tantalum particles an ideal material for applications in high

 temperature environments.

2. Corrosion resistance

Tantalum particles have good corrosion resistance and can remain stable in harsh chemical environments. This makes tantalum particles widely used in chemical, medical and

 other fields.

3. Excellent electrical conductivity

Tantalum particles have good electrical conductivity and can be used as conductive materials in the field of electronics. Its conductive property is stable and can conduct current

 effectively.

Tantalum particles are widely used in the evaporation coating industry, and their high melting point, corrosion resistance and good electrical conductivity make them an ideal 

material choice.